Approved
Fabrication and Characterisation of Finger Gates
Daniel Svedbrand (2011)
Start
2017-01-16
Presentation
2017-06-14
Location:
Finished:
2017-06-17
Master's thesis:
(Contact supervisor)
Abstract
The main part of the project will be to define and manufacture finger gate contacts for nanowire transistors using electron beam lithography (EBL) using the facilities in Lund NanoLab. The shape of the contacts will be made to optimize the performance of the transistors varying parameters such as gate width, metal thickness and spacer thickness between source and gate. Different type of resists will be tested to improve resolution. After the transistors are manufactured, they will be hooked up to a probing station and their full electrical properties (resistances and capacitances) will be determined, using DC and RF currents. This will be done using 4-point contacts and RF-probes for precise measurements. To achieve the goals the project will start with a literature study of the main subject and a cleanroom safety course to grant access Lund NanoLab where the main part of the practical work will be made. Timeline January 16 - February; Literature studies + access to lab equipment February - April; Lab work, measurements May - June; finish lab work and measurements, write thesis before June 15 - Present Work, thesis finished at least 2 weeks before deadline
Supervisor: Adam Jönsson (EIT) and Lars-Erik Wernersson (EIT)
Examiner: Erik Lind (EIT)